The growth of microcrystalline thin films using ECR-PECVD: Silicon and Silicon-Germanium
| dc.contributor.author | Huh, Yung | |
| dc.contributor.department | Electrical and Computer Engineering | |
| dc.date | 2020-08-05T05:02:07.000 | |
| dc.date.accessioned | 2021-02-26T08:40:12Z | |
| dc.date.available | 2021-02-26T08:40:12Z | |
| dc.date.copyright | Tue Jan 01 00:00:00 UTC 2002 | |
| dc.date.issued | 2002-01-01 | |
| dc.format.mimetype | application/pdf | |
| dc.identifier | archive/lib.dr.iastate.edu/rtd/19882/ | |
| dc.identifier.articleid | 20881 | |
| dc.identifier.contextkey | 18779845 | |
| dc.identifier.doi | https://doi.org/10.31274/rtd-20200803-104 | |
| dc.identifier.s3bucket | isulib-bepress-aws-west | |
| dc.identifier.submissionpath | rtd/19882 | |
| dc.identifier.uri | https://dr.lib.iastate.edu/handle/20.500.12876/97249 | |
| dc.language.iso | en | |
| dc.source.bitstream | archive/lib.dr.iastate.edu/rtd/19882/Huh_ISU_2002_H84.pdf|||Fri Jan 14 22:00:44 UTC 2022 | |
| dc.title | The growth of microcrystalline thin films using ECR-PECVD: Silicon and Silicon-Germanium | |
| dc.type | article | |
| dc.type.genre | thesis | |
| dspace.entity.type | Publication | |
| relation.isOrgUnitOfPublication | a75a044c-d11e-44cd-af4f-dab1d83339ff | |
| thesis.degree.discipline | Electrical Engineering | |
| thesis.degree.level | thesis | |
| thesis.degree.name | Master of Science |
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