Impulse Photothermal Evaluation of Materials Via Frequency Modulated Optical Reflectance II: Experimental

dc.contributor.author Power, J.
dc.contributor.author Mandelis, A.
dc.date 2018-02-14T04:45:39.000
dc.date.accessioned 2020-06-30T06:35:42Z
dc.date.available 2020-06-30T06:35:42Z
dc.date.copyright Sun Jan 01 00:00:00 UTC 1989
dc.date.issued 1989
dc.description.abstract <p>Recently, a powerful method of photothermal detection was reported which enabled thermal wave imaging to be carried out on micron sized structures in semiconductors [1,2]. The new method utilized the photothermally induced modulation of the sample’s surface optical reflectivity to detect thermal wave phenomena at bandwidths exceeding 10 MHz. The wide bandwidth capabilities of the method enabled very shallow structures to be analyzed in semiconducting materials because of the relationship that exists between the modulation frequency of the excitation beam and the thermal diffusion length.</p>
dc.format.mimetype application/pdf
dc.identifier archive/lib.dr.iastate.edu/qnde/1989/allcontent/78/
dc.identifier.articleid 1954
dc.identifier.contextkey 5783931
dc.identifier.s3bucket isulib-bepress-aws-west
dc.identifier.submissionpath qnde/1989/allcontent/78
dc.identifier.uri https://dr.lib.iastate.edu/handle/20.500.12876/59450
dc.language.iso en
dc.source.bitstream archive/lib.dr.iastate.edu/qnde/1989/allcontent/78/1989_Power_ImpulsePhotothermal.pdf|||Sat Jan 15 01:53:53 UTC 2022
dc.source.uri 10.1007/978-1-4613-0817-1_78
dc.title Impulse Photothermal Evaluation of Materials Via Frequency Modulated Optical Reflectance II: Experimental
dc.type event
dc.type.genre article
dspace.entity.type Publication
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