Temperature dependence of metal film growth via low‐energy electron diffraction intensity oscillations: Pt/Pd(100)

dc.contributor.author Flynn, D.
dc.contributor.author Evans, James
dc.contributor.author Thiel, P.
dc.contributor.department Ames National Laboratory
dc.contributor.department Physics and Astronomy
dc.contributor.department Mathematics
dc.date 2018-02-18T21:37:27.000
dc.date.accessioned 2020-06-30T06:19:32Z
dc.date.available 2020-06-30T06:19:32Z
dc.date.copyright Sun Jan 01 00:00:00 UTC 1989
dc.date.issued 1989
dc.description.abstract <p>A commercial, conventional low‐energy electron diffraction apparatus is used to monitor Bragg intensity oscillations during the growth of Pt on Pd(100). The effect of substrate temperature between 80 and 400 K is investigated. Between 80 and 300 K, two to three Bragg oscillations are observed. The oscillation amplitude damps out quickly as film coverage increases at fixed temperature, but damp out less quickly at the higher substrate temperatures. Above ∼350 K, reconstruction of the Pt overlayer interferes with the oscillations. These data indicate that a kinetic barrier, most probably the barrier to surface diffusion,inhibits the system from achieving macroscopic equilibrium, and that the true equilibrium growth mode for this system is layer‐by‐layer. A new, analytical procedure is used to determine the coverage distribution within the layers from the Bragg intensities during growth. Bragg oscillations are predicted to occur at low substrate temperatures where surface diffusion is minimal and deposition is essentially random, but restricted to the fourfold hollow adsorption sites.</p>
dc.description.comments <p>This article is published as Flynn, D. K., J. W. Evans, and P. A. Thiel. "Temperature dependence of metal film growth via low‐energy electron diffraction intensity oscillations: Pt/Pd (100)." <em>Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films</em> 7, no. 3 (1989): 2162-2166, doi:<a href="http://dx.doi.org/10.1116/1.575950" target="_blank">10.1116/1.575950</a>. Posted with permission.</p>
dc.format.mimetype application/pdf
dc.identifier archive/lib.dr.iastate.edu/physastro_pubs/419/
dc.identifier.articleid 1420
dc.identifier.contextkey 10634837
dc.identifier.s3bucket isulib-bepress-aws-west
dc.identifier.submissionpath physastro_pubs/419
dc.identifier.uri https://dr.lib.iastate.edu/handle/20.500.12876/57187
dc.language.iso en
dc.source.bitstream archive/lib.dr.iastate.edu/physastro_pubs/419/1989_Evans_TemperatureDependence.pdf|||Sat Jan 15 00:11:39 UTC 2022
dc.source.uri 10.1116/1.575950
dc.subject.disciplines Biological and Chemical Physics
dc.subject.disciplines Physics
dc.subject.keywords Chemical interdiffusion
dc.subject.keywords Electron diffraction
dc.subject.keywords Adsorption
dc.subject.keywords Diffusion barriers
dc.subject.keywords Film growth
dc.title Temperature dependence of metal film growth via low‐energy electron diffraction intensity oscillations: Pt/Pd(100)
dc.type article
dc.type.genre article
dspace.entity.type Publication
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