Magnetic force microscopy study of magnetization reversal in sputtered FeSiAl(N) films

dc.contributor.author Lo, Chester
dc.contributor.author Snyder, J.
dc.contributor.author Jiles, David
dc.contributor.author Leib, J.
dc.contributor.author Chen, R.
dc.contributor.author Kriegermeier-Sutton, B.
dc.contributor.author Kramer, Matthew
dc.contributor.author Jiles, David
dc.contributor.author Kief, M.
dc.contributor.department Materials Science and Engineering
dc.date 2018-02-14T10:13:22.000
dc.date.accessioned 2020-06-30T06:06:36Z
dc.date.available 2020-06-30T06:06:36Z
dc.date.copyright Mon Jan 01 00:00:00 UTC 2001
dc.date.embargo 2013-09-20
dc.date.issued 2001-03-01
dc.description.abstract <p>The magnetization reversal in a series of rf-sputtered FeSiAl(N) films has been studied using magnetic force microscopy. A system has been developed which has the capability to image domain structure while an in-plane magnetic field is applied <em>in situ</em>. All films exhibited a stripe domain structure in zero applied field which was indicative of a perpendicular component of domain magnetization which alternates in sign. All films showed a similar sequence of magnetization processes: on reducing the applied field from saturation a fine stripe domain structure nucleated and then coarsened as the field was decreased to zero. Local switching of domain contrast was observed along the steepest part of the hysteresis loop as the perpendicular component reversed. As the reverse field was increased toward saturation, the stripe domains disintegrated into smaller regions. This observation is consistent with an interpretation that the domain magnetization rotated locally into the sample plane. The saturation field and the film stress exhibited similar trends with nitrogen partial pressure. The results suggest that the perpendicular anisotropy that caused the formation of the stripe domain structure could be induced by the film stress via magnetoelastic coupling.</p>
dc.description.comments <p>The following article appeared in <em>Journal of Applied Physics</em> 89 (2001): 2868 and may be found at <a href="http://dx.doi.org/10.1063/1.1344579" target="_blank">http://dx.doi.org/10.1063/1.1344579</a>.</p>
dc.format.mimetype application/pdf
dc.identifier archive/lib.dr.iastate.edu/mse_pubs/109/
dc.identifier.articleid 1108
dc.identifier.contextkey 6004909
dc.identifier.s3bucket isulib-bepress-aws-west
dc.identifier.submissionpath mse_pubs/109
dc.identifier.uri https://dr.lib.iastate.edu/handle/20.500.12876/55435
dc.language.iso en
dc.source.bitstream archive/lib.dr.iastate.edu/mse_pubs/109/2001_Lo_MagneticForce.pdf|||Fri Jan 14 18:30:16 UTC 2022
dc.source.uri 10.1063/1.1344579
dc.subject.disciplines Electromagnetics and Photonics
dc.subject.disciplines Engineering Physics
dc.subject.keywords Ames Laboratory
dc.subject.keywords Electrical and Computer Engineering
dc.subject.keywords Magnetic films
dc.subject.keywords Thin film structure
dc.subject.keywords Magnetic force microscopy
dc.subject.keywords Magnetization reversals
dc.subject.keywords Magnetic domain structure
dc.title Magnetic force microscopy study of magnetization reversal in sputtered FeSiAl(N) films
dc.type article
dc.type.genre article
dspace.entity.type Publication
relation.isAuthorOfPublication cb9622ce-98bb-47c3-bc98-8ac772e1c44e
relation.isOrgUnitOfPublication bf9f7e3e-25bd-44d3-b49c-ed98372dee5e
File
Original bundle
Now showing 1 - 1 of 1
Name:
2001_Lo_MagneticForce.pdf
Size:
1.14 MB
Format:
Adobe Portable Document Format
Description:
Collections