Low pressure chemical vapor deposition of a-Si:H from disilane

dc.contributor.advisor	Vikram Dalal
dc.contributor.author	Petersburg, Cole
dc.contributor.department	Department of Electrical and Computer Engineering
dc.date	2018-08-22T22:53:47.000
dc.date.accessioned	2020-06-30T07:37:32Z
dc.date.available	2020-06-30T07:37:32Z
dc.date.copyright	Mon Jan 01 00:00:00 UTC 2007
dc.date.issued	2007-01-01
dc.format.mimetype	application/pdf
dc.identifier	archive/lib.dr.iastate.edu/rtd/14557/
dc.identifier.articleid	15556
dc.identifier.contextkey	6984445
dc.identifier.doi	https://doi.org/10.31274/rtd-180813-15742
dc.identifier.s3bucket	isulib-bepress-aws-west
dc.identifier.submissionpath	rtd/14557
dc.identifier.uri	https://dr.lib.iastate.edu/handle/20.500.12876/68096
dc.language.iso	en
dc.source.bitstream	archive/lib.dr.iastate.edu/rtd/14557/1443091.PDF\|\|\|Fri Jan 14 20:22:16 UTC 2022
dc.subject.disciplines	Electrical and Electronics
dc.subject.disciplines	Materials Science and Engineering
dc.subject.keywords	Electrical and computer engineering;Electrical engineering
dc.title	Low pressure chemical vapor deposition of a-Si:H from disilane
dc.type	thesis
dc.type.genre	thesis
dspace.entity.type	Publication
relation.isOrgUnitOfPublication	a75a044c-d11e-44cd-af4f-dab1d83339ff
thesis.degree.level	thesis
thesis.degree.name	Master of Science

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