A model for initiation of aluminum etch tunnels
Date
1996
Authors
Zhou, Ying
Major Professor
Advisor
Hebert, Kurt R.
Committee Member
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Abstract
In the past, tunnel etching of aluminum has been used primarily in the production of electrolytic capacitors. Research has therefore focussed on the parameters which will increase capacity. The increase in capacity obtained is in direct proportion to the increase in effective surface area. However, the factors which control the tunnel shape, and finally control the etched area, are related to the mechanism of the formation of tunnels from etch pits, which is incompletely understood. This work will focus on understanding the transformation from cubic etch pits into tunnel shapes. The ability to quantitatively predict the transformation is a critical test of the model's description of oxide passivation. Thus, important fundamental information about passivation may be gained.
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thesis