Ripening of monolayer vacancy pits on metal surfaces: Pathways, energetics, and size-scaling for Ag(111) versus Ag(100)

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dc.contributor.author Thiel, Patricia
dc.contributor.author Shen, Mingmin
dc.contributor.author Wen, J.-M.
dc.contributor.author Jenks, Cynthia
dc.contributor.author Thiel, Patricia
dc.contributor.author Liu, Da-Jiang
dc.contributor.author Evans, James
dc.contributor.author Evans, James
dc.contributor.department Ames Laboratory
dc.contributor.department Mathematics
dc.contributor.department Chemistry
dc.date 2018-02-13T12:50:51.000
dc.date.accessioned 2020-06-30T01:19:21Z
dc.date.available 2020-06-30T01:19:21Z
dc.date.copyright Mon Jan 01 00:00:00 UTC 2007
dc.date.embargo 2013-06-25
dc.date.issued 2007-01-01
dc.description.abstract <p>Scanning tunneling microscopy studies have revealed that monolayer-deep vacancy pits typically coarsen at 300 K via Smoluchowski ripening (SR) on Ag(111) surfaces and via Ostwald ripening (OR) on Ag(100) surfaces. We elucidate the underlying atomistic processes, the relevant energetics with some input from density functional theory analysis, and also the scaling of the ripening rate with mean pit size. Size scaling for SR reflects the size dependence of the pit diffusion coefficient, so we also discuss observed deviations from classical theories. SR dominates OR for pits on Ag(111) primarily due to its significantly lower effective energy barrier. However, the effective barrier for OR is not lower than that for SR for pits on Ag(100), and one must also account for the distinct size scaling of these pathways to explain the dominance of OR. We also briefly discuss the dependence on temperature of the dominant ripening pathway and the ripening behavior for adatom islands.</p>
dc.description.comments <p>This article is from <em>Physical Review B</em> 75, no. 24 (2007): 245409, doi:<a href="http://dx.doi.org/10.1103/PhysRevB.75.245409" target="_blank">10.1103/PhysRevB.75.245409</a>.</p>
dc.format.mimetype application/pdf
dc.identifier archive/lib.dr.iastate.edu/chem_pubs/33/
dc.identifier.articleid 1032
dc.identifier.contextkey 4258013
dc.identifier.s3bucket isulib-bepress-aws-west
dc.identifier.submissionpath chem_pubs/33
dc.identifier.uri https://dr.lib.iastate.edu/handle/20.500.12876/14779
dc.language.iso en
dc.source.bitstream archive/lib.dr.iastate.edu/chem_pubs/33/2007_ThielPA_RipeningMonolayerVacancy.pdf|||Fri Jan 14 23:37:18 UTC 2022
dc.source.uri 10.1103/PhysRevB.75.245409
dc.subject.disciplines Mathematics
dc.subject.disciplines Physical Chemistry
dc.subject.keywords Ames Laboratory
dc.subject.keywords Mathematics
dc.title Ripening of monolayer vacancy pits on metal surfaces: Pathways, energetics, and size-scaling for Ag(111) versus Ag(100)
dc.type article
dc.type.genre article
dspace.entity.type Publication
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