Creating nanoscale Ag patterns on the Si(111)–(√3 × √3)R30°-Ag surface via guided self-assembly

Date
2012-07-20
Authors
Belianinov, Alex
Ünal, Barış
Tringides, Michael
Thiel, Patricia
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Altmetrics
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Research Projects
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Chemistry
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Abstract

Patterns of Ag nanostructures can be created on the Si(111)–(√3 × √3)R30°-Ag surface, using a simple two-step process in ultrahigh vacuum. First, patterns are created using the tip of a scanning tunneling microscope. Second, Ag is deposited at room temperature. The Ag diffuses over long distances on the surface and selectively aggregates at the patterned regions. The size of the Ag features is ∼3–4 nm.

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The following article appeared in Journal of Vacuum Science and Technology B, 30, no. 5 (Sep/Oct 2012): 050601 and may be found at http://dx.doi.org/10.1116/1.4738745.

Keywords
aggregates (materials), elemental semiconductors, nanofabrication, nanopatterning, scanning tunnelling microscopy, self-assembly, silicon, silver, surface diffusion, vacuum deposition, Ames Laboratory, Material Science and Engineering, Physics and Astronomy
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