Structural Properties of Lithium Thio-Germanate Thin Film Electrolytes Grown by Radio Frequency Sputtering Seo, Inseok Martin, Steve Martin, Steve
dc.contributor.department Materials Science and Engineering 2018-02-13T19:47:48.000 2020-06-30T06:08:45Z 2020-06-30T06:08:45Z Sat Jan 01 00:00:00 UTC 2011 2013-07-23 2011-03-21
dc.description.abstract <p>In this study, lithium thio-germanate thin film electrolytes have been successfully prepared by radio frequency (RF) magnetron sputtering deposition in Ar gas atmospheres. The targets for RF sputtering were prepared by milling and pressing appropriate amounts of the melt-quenched starting materials in the <em>n</em>Li2S + GeS2 (<em>n</em> = 1, 2, and 3) binary system. Approximately 1 μm thin films were grown on Ni coated Si (Ni/Si) substrates and pressed CsI pellets using 50 W power and 25 mtorr (3.3 Pa) Ar gas pressures to prepare samples for Raman and Infrared (IR) spectroscopy, respectively. To improve the adhesion between the silicon substrate and the thin film electrolyte, a sputtered Ni layer (120 nm) was used. The surface morphologies and thickness of the thin films were determined by field emission scanning electron microscopy (FE-SEM). The structural properties of the starting materials, target materials, and the grown thin films were examined by X-ray diffraction (XRD), Raman, and IR spectroscopy.</p>
dc.description.comments <p>Reprinted with permission from <em>Inorganic Chemistry</em> 50 (2011): 2143–2150, doi:<a href="" target="_blank">10.1021/ic101448m</a>. Copyright 2011 American Chemical Society.</p>
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dc.identifier.articleid 1049
dc.identifier.contextkey 5034236
dc.identifier.s3bucket isulib-bepress-aws-west
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dc.language.iso en
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dc.source.uri 10.1021/ic101448m
dc.subject.disciplines Materials Science and Engineering
dc.subject.disciplines Physical Chemistry
dc.title Structural Properties of Lithium Thio-Germanate Thin Film Electrolytes Grown by Radio Frequency Sputtering
dc.type article
dc.type.genre article
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