Theoretical Study of Addition Reactions of SiX2 to Acetylene (X ) H, CH3, t-Bu, Cl, F)

Thumbnail Image
Supplemental Files
Date
1999-10-01
Authors
Chung, Gyusung
Gordon, Mark
Major Professor
Advisor
Committee Member
Journal Title
Journal ISSN
Volume Title
Publisher
Authors
Person
Research Projects
Organizational Units
Organizational Unit
Journal Issue
Is Version Of
Versions
Series
Department
Chemistry
Abstract

The addition reaction of SiX2 (X = H, CH3, t-Bu, F, and Cl) to acetylene is considered using ab initio calculations. Second-order perturbation theory (MP2) and coupled cluster CCSD(T) calculations confirm there is no barrier for SiH2, Si(CH3)2, and Si(t-Bu)2 additions, while electronegative substituents such as F and Cl have nonzero barriers. It is concluded that electronegativity is more important than steric effects in determining barrier heights for these reactions. The CCSD(T)/6-31+G* barriers for SiF2 and SiCl2 additions are computed to be about 24 and 8 kcal/mol, respectively.

Comments

Reprinted (adapted) with permission from Organometallics 18 (1999): doi:10.1021/om990319w. Copyright 1999 American Chemical Society.

Description
Keywords
Citation
DOI
Subject Categories
Copyright
Fri Jan 01 00:00:00 UTC 1999
Collections