The growth of microcrystalline thin films using ECR-PECVD: Silicon and Silicon-Germanium
The growth of microcrystalline thin films using ECR-PECVD: Silicon and Silicon-Germanium
%202012-2015%20Ivan%20Malopinsky%20-%20http%3A%2F%2Fimsky.co%0A--%3E%3Cdefs%3E%3Cstyle%20type%3D%22text%2Fcss%22%3E%3C!%5BCDATA%5B%23holder_1543e460b05%20text%20%7B%20fill%3A%23AAAAAA%3Bfont-weight%3Abold%3Bfont-family%3AArial%2C%20Helvetica%2C%20Open%20Sans%2C%20sans-serif%2C%20monospace%3Bfont-size%3A10pt%20%7D%20%5D%5D%3E%3C%2Fstyle%3E%3C%2Fdefs%3E%3Cg%20id%3D%22holder_1543e460b05%22%3E%3Crect%20width%3D%2293%22%20height%3D%22120%22%20fill%3D%22%23FFFFFF%22%2F%3E%3Cg%3E%3Ctext%20x%3D%2235.6171875%22%20y%3D%2257%22%3ENo%3C%2Ftext%3E%3Ctext%20x%3D%2210.8125%22%20y%3D%2272%22%3EThumbnail%3C%2Ftext%3E%3C%2Fg%3E%3C%2Fg%3E%3C%2Fsvg%3E)
Date
2002-01-01
Authors
Huh, Yung
Journal Title
Journal ISSN
Volume Title
Publisher
Altmetrics
Authors
Research Projects
Organizational Units
Electrical and Computer Engineering
Organizational Unit