Anisotropic Disorder and Thermal Stability of Silicane Ryan, Bradley J. Roling, Luke T.
dc.contributor.department Chemical and Biological Engineering 2022-01-05T16:44:48Z 2022-01-05T16:44:48Z 2021-09-28
dc.description.abstract Atomically thin silicon nanosheets (SiNSs), such as silicane, have potential for next-generation computing paradigms, such as integrated photonics, owing to their efficient photoluminescence emission and complementary-metal-oxide-semiconductor (CMOS) compatibility. To be considered as a viable material for next-generation photonics, the SiNSs must retain their structural and optical properties at operating temperatures. However, the intersheet disorder of SiNSs and their nanoscale structure makes structural characterization difficult. Here, we use synchrotron X-ray diffraction and atomic pair distribution function (PDF) analysis to characterize the anisotropic disorder within SiNSs, demonstrating they exhibit disorder within the intersheet spacing, but have little translational or rotational disorder among adjacent SiNSs. Furthermore, we identify changes in their structural, chemical, and optical properties after being heated in an inert atmosphere up to 475 °C. We characterized changes of the annealed SiNSs using synchrotron-based total X-ray scattering, infrared spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy, electron paramagnetic resonance, absorbance, photoluminescence, and excited-state lifetime. We find that the silicon framework is robust, with an onset of amorphization at ∼300 °C, which is well above the required operating temperatures of photonic devices. Above ∼300 °C, we demonstrate that the SiNSs begin to coalesce while keeping their translational alignment to yield amorphous silicon nanosheets. In addition, our DFT results provide information on the structure, energetics, band structures, and vibrational properties of 11 distinct oxygen-containing SiNSs. Overall, these results provide critical information for the implementation of atomically thin silicon nanosheets in next-generation CMOS-compatible integrated photonic devices.
dc.description.comments This document is the unedited Author’s version of a Submitted Work that was subsequently accepted for publication in ACS Nano, copyright © 2021 American Chemical Society after peer review. To access the final edited and published work see DOI: 10.1021/acsnano.1c04230. Posted with permission.
dc.language.iso en_US
dc.publisher American Chemical Society
dc.source.uri *
dc.subject silicon nanosheets
dc.subject pair distribution function
dc.subject photonics
dc.subject optoelectronic
dc.subject density functional theory
dc.subject.disciplines DegreeDisciplines::Engineering::Chemical Engineering
dc.subject.disciplines DegreeDisciplines::Engineering::Nanoscience and Nanotechnology
dc.subject.disciplines DegreeDisciplines::Physical Sciences and Mathematics::Chemistry::Materials Chemistry
dc.title Anisotropic Disorder and Thermal Stability of Silicane
dc.type Article
dspace.entity.type Publication
relation.isAuthorOfPublication d287cf9b-3290-4e8e-aa90-57ad848daebd
relation.isOrgUnitOfPublication 86545861-382c-4c15-8c52-eb8e9afe6b75
Original bundle
Now showing 1 - 1 of 1
No Thumbnail Available
4.46 MB
Adobe Portable Document Format