Process Control in IC Manufacturing with Thermal Waves
dc.contributor.author | Rosencwaig, Allan | |
dc.date | 2018-02-14T05:26:20.000 | |
dc.date.accessioned | 2020-06-30T06:37:09Z | |
dc.date.available | 2020-06-30T06:37:09Z | |
dc.date.copyright | Mon Jan 01 00:00:00 UTC 1990 | |
dc.date.issued | 1990 | |
dc.description.abstract | <p>In today’s semiconductor market, manufacturers face a daunting challenge. Product concepts evolve rapidly in response to rapidly changing markets while design rules, i.e., device geometries, become increasingly smaller and wafers become larger. Devices must run faster, reliability must improve and the resultant increasing complexity in IC design and fabrication technology intensifies the need for tighter controls of process variables. To compete effectively in this market, manufacturers must improve both product development and product manufacturing processes.</p> | |
dc.format.mimetype | application/pdf | |
dc.identifier | archive/lib.dr.iastate.edu/qnde/1990/allcontent/261/ | |
dc.identifier.articleid | 2299 | |
dc.identifier.contextkey | 5793338 | |
dc.identifier.s3bucket | isulib-bepress-aws-west | |
dc.identifier.submissionpath | qnde/1990/allcontent/261 | |
dc.identifier.uri | https://dr.lib.iastate.edu/handle/20.500.12876/59654 | |
dc.language.iso | en | |
dc.relation.ispartofseries | Review of Progress in Quantitative Nondestructive Evaluation | |
dc.source.bitstream | archive/lib.dr.iastate.edu/qnde/1990/allcontent/261/1990_RosencwaigA_ProcessControl.pdf|||Fri Jan 14 23:02:04 UTC 2022 | |
dc.subject.disciplines | Manufacturing | |
dc.subject.disciplines | Process Control and Systems | |
dc.title | Process Control in IC Manufacturing with Thermal Waves | |
dc.type | event | |
dc.type.genre | article | |
dspace.entity.type | Publication | |
relation.isSeriesOfPublication | 289a28b5-887e-4ddb-8c51-a88d07ebc3f3 |
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