Process Control in IC Manufacturing with Thermal Waves

dc.contributor.author Rosencwaig, Allan
dc.date 2018-02-14T05:26:20.000
dc.date.accessioned 2020-06-30T06:37:09Z
dc.date.available 2020-06-30T06:37:09Z
dc.date.copyright Mon Jan 01 00:00:00 UTC 1990
dc.date.issued 1990
dc.description.abstract <p>In today’s semiconductor market, manufacturers face a daunting challenge. Product concepts evolve rapidly in response to rapidly changing markets while design rules, i.e., device geometries, become increasingly smaller and wafers become larger. Devices must run faster, reliability must improve and the resultant increasing complexity in IC design and fabrication technology intensifies the need for tighter controls of process variables. To compete effectively in this market, manufacturers must improve both product development and product manufacturing processes.</p>
dc.format.mimetype application/pdf
dc.identifier archive/lib.dr.iastate.edu/qnde/1990/allcontent/261/
dc.identifier.articleid 2299
dc.identifier.contextkey 5793338
dc.identifier.s3bucket isulib-bepress-aws-west
dc.identifier.submissionpath qnde/1990/allcontent/261
dc.identifier.uri https://dr.lib.iastate.edu/handle/20.500.12876/59654
dc.language.iso en
dc.relation.ispartofseries Review of Progress in Quantitative Nondestructive Evaluation
dc.source.bitstream archive/lib.dr.iastate.edu/qnde/1990/allcontent/261/1990_RosencwaigA_ProcessControl.pdf|||Fri Jan 14 23:02:04 UTC 2022
dc.subject.disciplines Manufacturing
dc.subject.disciplines Process Control and Systems
dc.title Process Control in IC Manufacturing with Thermal Waves
dc.type event
dc.type.genre article
dspace.entity.type Publication
relation.isSeriesOfPublication 289a28b5-887e-4ddb-8c51-a88d07ebc3f3
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