Large-Scale Synthesis of Colloidal Si Nanocrystals and Their Helium Plasma Processing into Spin-On, Carbon-Free Nanocrystalline Si Films

Date
2018-05-30
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Mohapatra, Pratyasha
Mendivelso-Perez, Deyny
Bobbitt, Jonathan
Shaw, Santosh
Smith, Emily
Yuan, Bin
Tian, Xinchun
Smith, Emily
Cademartiri, Ludovico
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Ames Laboratory
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Chemistry
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Ames LaboratoryChemical and Biological EngineeringChemistryChemical and Biological Engineering
Abstract

This paper describes a simple approach to the large-scale synthesis of colloidal Si nanocrystals and their processing into spin-on carbon-free nanocrystalline Si films. The synthesized silicon nanoparticles are capped with decene, dispersed in hexane, and deposited on silicon substrates. The deposited films are exposed to nonoxidizing room-temperature He plasma to remove the organic ligands without adversely affecting the silicon nanoparticles to form crack-free thin films. We further show that the reactive ion etching rate in these films is 1.87 times faster than that for single-crystalline Si, consistent with a simple geometric argument that accounts for the nanoscale roughness caused by the nanoparticle shape.

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